Applications of hafnium
Metallurgy and Mechanical Engineering
Addition of hafnium significantly strengthens the alloy, increases the tensile, shear and torsional strength, improves resistance to vibration and shock loads Carbide and hafnium boride (melting point 3250°C) are used in superhard alloys, hafnium is alloyed with such rare-earth elements as terbium and samarium when creating powerful permanent magnets. Hafnium-doped titanium alloys serve as the basis for parts of ship engines. Hafnium alloying of nickel hardens the alloy and increases corrosion resistance. Hafnium alloying of tantalum leads to formation of a protective film of complex oxides on the surface that increases resistance to oxidation and thermal shock. Gas rudders and jet engine nozzles were created using alloys of these two metals.
Nuclear power.
The ability to capture neutrons causes the use of hafnium in control rods of nuclear boilers, Ta-W-Hf alloy is the best for feeding fuel in gas-phase nuclear engines. Today there is a promising development of the so-called hafnium bomb.
Optics
Owing to their heat resistance and very high degree of refraction HfO2 and HfF4 are used in fibre optics, astronomical and multilayer X-ray mirrors as well as in night vision devices. Melting special glass, oxide, boride, carbide, lithium hafnate, dysprosium hafnate are used.
Radioelectronics
Low work of electron yield (3.53 eV) allows to produce cathodes of powerful radio lamps and electron guns and effective thermionic electrogenerators.
Electrical Engineering
.Production of electrodes for welding in argon, welding low-carbon steel in aCO2 atmosphere. Such electrodes proved to be almost 4 times more resistant than tungsten electrodes. Let us also note a great economic effect of hafnium-tantalum alloy application for the electrodes of oxygen-flame and air-plasma metal cutting.
Microelectronics
HfO2-based dielectrics with high dielectric constant are successfully replacing silicon oxide in computers today, allowing much higher fill densities of chips. Hafnium silicide dielectrics also have significant dielectric permittivity. Scandium hafnium alloys are known in microelectronics as the basis for resistive films.
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